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Focused Beam Scatterometry For Semiconductor Metrology
The capacity to measure nanoscale features rapidly and accurately is of central importance for the monitoring of manufacturing processes in the production of computer integrated circuits. It is known that far-field scattered light requires a priori sample information in order to reconstruct nanoscale information such as is required in semiconductor...
Published: 11/14/2019   |   Inventor(s): Miguel Alonso Gonzalez, Stephen Head, Michael Theisen, Thomas Brown
Keywords(s):  
Category(s): Nanotechnology, Optics